JPH0635467Y2 - 縦型ｃｖｄ装置用石英製ウェ−ハホルダ - Google Patents
縦型ｃｖｄ装置用石英製ウェ−ハホルダInfo
- Publication number
- JPH0635467Y2 JPH0635467Y2 JP6652787U JP6652787U JPH0635467Y2 JP H0635467 Y2 JPH0635467 Y2 JP H0635467Y2 JP 6652787 U JP6652787 U JP 6652787U JP 6652787 U JP6652787 U JP 6652787U JP H0635467 Y2 JPH0635467 Y2 JP H0635467Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- holder
- film
- wafer holder
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010453 quartz Substances 0.000 title claims description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 16
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 3
- 229920005591 polysilicon Polymers 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 90
- 230000007246 mechanism Effects 0.000 description 8
- 239000012495 reaction gas Substances 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6652787U JPH0635467Y2 (ja) | 1987-04-30 | 1987-04-30 | 縦型ｃｖｄ装置用石英製ウェ−ハホルダ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6652787U JPH0635467Y2 (ja) | 1987-04-30 | 1987-04-30 | 縦型ｃｖｄ装置用石英製ウェ−ハホルダ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63177035U JPS63177035U (en]) | 1988-11-16 |
| JPH0635467Y2 true JPH0635467Y2 (ja) | 1994-09-14 |
Family
ID=30904615
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6652787U Expired - Lifetime JPH0635467Y2 (ja) | 1987-04-30 | 1987-04-30 | 縦型ｃｖｄ装置用石英製ウェ−ハホルダ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0635467Y2 (en]) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5584936A (en) * | 1995-12-14 | 1996-12-17 | Cvd, Incorporated | Susceptor for semiconductor wafer processing |
| TWI327339B (en) * | 2005-07-29 | 2010-07-11 | Nuflare Technology Inc | Vapor phase growing apparatus and vapor phase growing method |
| JP2010258288A (ja) * | 2009-04-27 | 2010-11-11 | Sanyo Electric Co Ltd | 固定治具およびそれを用いた半導体装置の製造方法 |
| JP2014060403A (ja) * | 2013-09-24 | 2014-04-03 | Kokusai Electric Semiconductor Service Inc | 基板保持具及びウェーハ支持方法 |
-
1987
- 1987-04-30 JP JP6652787U patent/JPH0635467Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63177035U (en]) | 1988-11-16 |
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